| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d669af06cb2abbcd6823699582a97002 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2006-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2002-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2006-80
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2006-22 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B33-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3105 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B33-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
| filingDate |
2003-01-30^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7860c00f065dbdf64fce8ad5c4a3f7b9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_628ee5e33ab3367b362f7839a80e1c57
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8beeef7c383cda210dadc7851c81336d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_84e8c94edecd1cda1f4d92f5ee96a70e |
| publicationDate |
2003-08-16^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200302859-A |
| titleOfInvention |
Dispersion for chemical mechanical polishing |
| abstract |
Aqueous dispersion for the chemical mechanical polishing of oxidic surfaces, containing a powder of pyrogenically produced silicon dioxide doped with aluminium oxide by means of an aerosol, which is characterised in that the powder displays an aluminium oxide content of between 0.01 and 3 wt.%, preferably between 0.2 and 1.5 wt.%, relative to the total amount of powder, and an average particle diameter in the dispersion of a maximum of 0.1 μ m. The dispersion is produced by dispersing the silicon dioxide powder doped with aluminium oxide by means of an aerosol in an aqueous medium with an energy input of at least 200 kJ/m3. The dispersion is used in the chemical mechanical polishing of oxidic surfaces, preferably silicon dioxide. |
| priorityDate |
2002-02-07^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |