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filingDate 2003-03-03^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d0471f4c69a52efa1d32d338d85e3dfa
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publicationDate 2004-02-01^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-200401804-A
titleOfInvention Processes for producing polysiloxanes and photoresist compositions comprising same
abstract New methods are provided for synthesis of polysiloxanes (silsesquioxanes) and photoresists comprising same. Synthetic methods of the invention include use of a polymerization templating reagent that has multiple reactive nitrogen groups, particularly a diamine reagent.
priorityDate 2002-03-03^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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