| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2007-03-09^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0806ad1e19c2fad0b33a56cea7d2b8b0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4a20104ecee0ec4bcd8f7e4cf2aa6743
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e2edb7820c2d81587dca1d7221a74c61 |
| publicationDate |
2008-01-16^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200804983-A |
| titleOfInvention |
Chemically amplifying positive photoresist composition |
| abstract |
Disclosed is a positive amplifying positive photoresist composition, which is characterized by containing (A) a resin obtained from reaction among linear phenol resin, a compound of which the molecule contains at least two vinyl ether structures, and poly(hydroxystyrene) of which the molecule having hydroxkl groups that are partly protected by substituted 1-alkoxyalkyl or 2-oxocycloaklyl, and (B) acid generation agent. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109298600-A |
| priorityDate |
2006-03-17^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |