| abstract |
Provided are polymerizable fluorine-containing sulfonic acid onium salts represented by formula (2) and polymers wherein same have been polymerized. By using the invented sulfonate resins, resist compositions of superior resolution, broad depth of focus allowance (DOF), small line edge roughness ("LER") and high sensitivity can be prepared. (In the formula, Z represents a substituted or unsubstituted 1-6 carbon straight chain or branched alkylene group or a divalent group obtained by linking said alkylene groups in series with divalent groups obtained by eliminating two hydrogen atoms from an alicyclic or aromatic hydrocarbon. R represents a hydrogen atom, a halogen atom or a 1-3 carbon alkyl group or a fluorine-containing alkyl group. Q+ represents a sulfonium cation or iodonium cation.) |