http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201217910-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02T10-46 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 |
| filingDate | 2010-10-28^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2bf1e121849649abfeff5dc1ca55818b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_57a3eeaa18366f0f1bd4ee90efcf657a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_90b346a617bf5a7c1719373902990a9a |
| publicationDate | 2012-05-01^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201217910-A |
| titleOfInvention | Radiation-sensitive composition, protective film, interlayer insulation film and method for forming the same |
| abstract | An object of the present invention is to provide a radiation-sensitive composition which is suitable for forming protective film and interlayer insulation film satisfying general requirements (such as transparency, heat-resistant transparency, surface hardness and so on) while having high adherence to ITO transparent conducting film or metal (such as molybdenum) wiring and high cracking resistance even under intensive conditions of high temperature and high humidity. The present invention is a radiation-sensitive composition comprising [A] siloxane, [B] polymer having repeat unit represented by the following formula (1) (wherein R1 is a hydrogen atom or a C1 to 4 alkyl group; R2 to R6 independently represents a hydrogen atom, a hydroxyl group or a C1 to 4 alkyl group; B is a single bond, -COO-* or -CONH-*; m is an integer of 0 to 3. Provided that at least one of R2 to R6 is a hydroxyl group; each linking bond * in -COO-* or -CONH-* is bonded to the carbon of (CH2)m) and [C] radiation-sensitive acid generator or radiation-sensitive base generator. |
| priorityDate | 2009-10-28^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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