| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-10 |
| filingDate |
2012-01-20^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7583c5ef3c449c07a1653717ed916d1a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a0067512e2b9d1e3e35daf7337548297
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a9163d5763457518986267c7f5364aae
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9473e6941c583ff6ee73ad721e18287 |
| publicationDate |
2012-09-16^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201237554-A |
| titleOfInvention |
Radiation-sensitive resin composition |
| abstract |
A radiation-sensitive resin composition includes an acid-labile group-containing polymer and photoacid generator. The radiation-sensitive resin composition is used to form a resist pattern using a developer that includes an organic solvent in an amount of 80 mass % or more. The radiation-sensitive resin composition has a contrast value [gamma] of 5.0 to 30.0. The contrast value [gamma] is calculated from a resist dissolution contrast curve obtained when developing the radiation-sensitive resin composition using the organic solvent. |
| priorityDate |
2011-02-04^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |