http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201314916-A

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filingDate 2009-10-20^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a5d9cf7ff1e489b8fdf9960789a811c8
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publicationDate 2013-04-01^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201314916-A
titleOfInvention Semiconductor device and method of manufacturing same
abstract The present invention provides a semiconductor device and a method of fabricating the same. It is an object of the present invention to improve the field effect mobility of a thin film transistor using an oxide semiconductor. Another object is to suppress an increase in off current even in a thin film transistor having improved field effect mobility. In a thin film transistor using an oxide semiconductor layer, thin film electricity can be improved by forming a semiconductor layer having a higher conductivity and a smaller thickness than the oxide semiconductor layer between the oxide semiconductor layer and the gate insulating layer The field effect mobility of the crystal and the increase in the off current can be suppressed.
priorityDate 2008-10-31^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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