http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201329637-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-265 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-385 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2012-09-12^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5fe12e3bb401a4731ef3d014a7d0f335 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3a5e27cb33dcee3594a1877478857e98 |
| publicationDate | 2013-07-16^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201329637-A |
| titleOfInvention | Photoresist composition and method for forming photoresist pattern |
| abstract | The present invention provides a method for forming a photoresist composition and a photoresist pattern having excellent lithography etching characteristics and pattern shapes. A photoresist composition comprising a substrate component (A) which generates an acid by exposure and which changes the solubility of a developer by an action of an acid, wherein the substrate component (A) is contained. The structural unit (a0-1) represented by the formula (a0-1) and the resin component (A1) of the structural unit (a0-2) which generates an acid by exposure. □ In the formula, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms or a halogenated alkyl group having 1 to 5 carbon atoms, and R 2 is a divalent linking group. |
| priorityDate | 2011-09-13^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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