| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2006
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-063 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2015-04-23^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_57d69c998ba644a25a483999a8d015ba
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d773c26933f47f09f8fae9fcf14edf1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2755db4cf58164bd00e91fcc1d759dcc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7de9756b89402063f69b799d607f3fff
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c607cdb583055fac7d5dbe1b287fa1a8 |
| publicationDate |
2015-12-16^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201546558-A |
| titleOfInvention |
Pattern forming method, sensitized ray or radiation sensitive resin composition, sensitized ray or radiation sensitive film, method of manufacturing electronic component, and electronic component |
| abstract |
A pattern forming method using a sensitized ray-sensitive or radiation-sensitive resin composition in which ΔDth represented by the following formula (1) satisfies 0.8 or more. (In the formula, Dth (PTI) represents a threshold deprotection ratio of an acid-decomposable group with respect to a film thickness of a sensitizing ray or a radiation sensitive film after development using an alkaline developing solution, and Dth (NTI) means relative to The threshold deprotection rate of the acid-decomposable group of the film thickness of the sensitizing ray or the radiation sensitive film after development using a developing solution containing an organic solvent)n[Expression 1]n△ Dth = Dth (PTI) / Dth (NTI) (1) |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112794941-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I796958-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I760263-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I737823-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10942455-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112920314-A |
| priorityDate |
2014-06-13^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |