| abstract |
An object of the present invention is to provide a compound containing a modified phenolic hydroxyl group, a photosensitive composition containing the compound, a photoresist material containing the photosensitive composition, and a coating comprising the photoresist material, which are excellent in sensitivity and heat resistance. A film containing a modified phenolic hydroxyl group-containing compound having a molecular structure represented by the following formula (1) but excluding a molecular structure represented by the following formula (2):n□ [wherein R1 represents a tertiary alkyl group, an alkoxyalkyl group, an aryloxyalkyl group, a decyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a hetero atom-containing cyclic aliphatic hydrocarbon group, or a trioxane. The alkyl group, R 2 represents a hydrogen atom, an alkyl group, an alkoxy group, an aryl group which may have a substituent, an aralkyl group which may have a substituent, or a halogen atom, R 3 represents an alkyl group which may have a substituent, or may have The aryl group of the substituent]. |