http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201635034-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0606c8e113c860d8a6c41e2aaaf3120d |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| filingDate | 2015-03-23^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eefb18a8e781220e654c55a5fce5ed39 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_18f47657288576cd97fe9241f67013cb |
| publicationDate | 2016-10-01^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201635034-A |
| titleOfInvention | Photosensitive polyoxyalkylene composition, protective film and component having protective film |
| abstract | The present invention relates to a photosensitive polyoxyalkylene composition and a protective film produced therefrom. The photosensitive polyoxyalkylene composition includes a polyoxyalkylene polymer (A), an o-naphthoquinonediazide sulfonate (B), and a solvent (C). The obtained protective film has good light transmittance and sensitivity and can be used for forming a planarizing film for a thin film transistor substrate, a protective film or a core material or a cladding material for an optical waveguide. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I721145-B |
| priorityDate | 2015-03-23^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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