| abstract |
The present invention relates to a film forming composition for cleaning a semiconductor substrate, comprising: a compound having a polar group, a group represented by the following formula (i) or a combination of these having a molecular weight of 300 or more; and a solvent. In the following formula (i), R1nA group that is dissociated by the action of heat or acid. The polar group is preferably a hydroxyl group, a carboxyl group, a decylamino group, an amine group, a sulfonyl group, a sulfo group or a combination thereof. It is preferred to contain a polymer as the compound, and the polymer has a weight average molecular weight of 300 or more and 50,000 or less. Preferably, the polymer is a cyclic polymer, and the cyclic polymer has a weight average molecular weight of 300 or more and 3,000 or less. □ |