| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a3d52eacd83e723ebd2ca61b598586c2 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-0635
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-0435
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-24475
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2201-30426 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3177
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-147
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J1-3044
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-073
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-28 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-317
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-073
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J1-304 |
| filingDate |
2017-10-12^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_af9bcd4fcca3d996b4d708a23c010a99
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b5639ba6826796bd6a1a8186cfa490df
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ca75f91266794f449562f91414979aea
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d0a276fbd7d65f6f258d07dd13f6362 |
| publicationDate |
2018-07-16^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201826312-A |
| titleOfInvention |
Multi-row electron beam photoetching of a field emitter comprising a germanium substrate having a boron layer |
| abstract |
A multi-row electron beam apparatus includes an electron source including a plurality of field emitters fabricated on a surface of a substrate. To prevent oxidation of the crucible, a thin continuous layer of boron is placed directly on the output surface of the field emitters. The field emitters can take a variety of shapes including a cone, a cone or a circular whisker. An optional gate layer can be placed on the output surface adjacent the field emitters. The field emitter can be doped via p-type or n-type. A circuit can be incorporated into the wafer to control the emission current. A light source can be configured to illuminate the electron source and control the emission current. The multi-row electron beam apparatus can be a multi-row electron beam photoetching system configured to write a pattern onto the same. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I714108-B |
| priorityDate |
2016-10-13^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |