| abstract |
The present invention provides a sensitized radiation or radiation-sensitive resin composition excellent in LER. Furthermore, there is provided a resist film, a pattern forming method, and a method of manufacturing an electronic component using the above-mentioned sensitized radiation or radiation-sensitive resin composition. The sensitized radiation or radiation sensitive resin composition contains a compound that generates an acid by irradiation with actinic rays or radiation and a resin whose polarity is increased by the action of an acid, and the above compound has a specific general formula (X) Said. |