| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_81a5d1f0d5dfdf51d2495345dd56dccc |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45536
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-458
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4583
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-452
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-505
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4412
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32532
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45578
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45546
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-507 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2018-06-19^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c0cef882637bfd1d416cc95c6e9f54b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1602cd17d99da4182eaedccaab12d0f9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f8d0abf1145b154ceb9a0944e63f4e23
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4eac98ba72545c1b92fd980c51c6da6c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c852bff3243dcb90fa5aece6e9cecf43 |
| publicationDate |
2019-04-16^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201916162-A |
| titleOfInvention |
Batch type plasma substrate processing device |
| abstract |
A substrate processing apparatus according to an exemplary embodiment includes: a first pipe member configured to provide a processing space in which a plurality of substrates are processed; and a substrate support member configured to load a plurality of substrates in a first direction in the processing space; A plurality of gas supply parts provided with a supply port for supplying a processing gas required for a process of processing a substrate; an exhaust part configured to communicate with the first pipe and discharge processing residues inside the processing space to the outside; and a plasma The reaction part is disposed outside the first pipe and is configured to use a plasma to decompose the processing gas supplied from the gas supply part and provide the decomposed processing gas to the processing space. |
| priorityDate |
2017-09-20^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |