http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201940551-A

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filingDate 2019-03-20^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7d22cceb2ffa1bbecddc1ce6499d8fb4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a10c22008b61044d8d660c3cde26eae7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e61b38a2da8f34a3f2159a536525f457
publicationDate 2019-10-16^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201940551-A
titleOfInvention Alkali-soluble resin, photosensitive resin composition, photosensitive sheet, cured film, interlayer insulating film or semiconductor protective film, method for producing relief pattern of cured film, electronic component or semiconductor device
abstract The present invention provides an alkali-soluble resin that can obtain a cured film with high elongation, low stress, high metal adhesion, and high heat resistance, and a photosensitive resin composition containing the same. The (A) alkali-soluble resin system of the present invention is characterized by having a structure represented by the general formula (1) and satisfying the following (I) and (II).n n n (I) the general formula (1), X 1, with respect to 100 mole% X 1 and X 2 in total, comprising 30 to 70 mole% of an aliphatic chain having a carbon number of an organic group having 8 to 30, (II) Y 1 as the general formula (1) contains 100 mol% of the total amount of Y 1 and Y 2 and contains 1 to 30 mol% of an organic group having a diphenyl ether structure, (Formula (1), X 1 represents 2 to 100 carbon atoms, a divalent organic group, Y 1 and Y 2 represents 2 to 100 carbon atoms having 2 to 6 monovalent organic group, X 2 represents C2-4 100 tetravalent organic groups, p and q represent integers in the range of 0 to 4, and n 1 and n 2 represent integers in the range of 5 to 100,000).
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I787658-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11456266-B2
priorityDate 2018-03-22^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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