| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_38ed56a4b4e8e2315b2b3308bffedb3f |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32135 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-42356
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-401
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-785
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28194
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28556
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28562
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28088
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66795
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76843
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3213
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76865
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-4966
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32135 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-20 |
| filingDate |
2019-08-26^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_08c25e3a39bb003a4a3d1485ff385138
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_958c37f3972ed0979437acbb32b3b83b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_af48e974c9b1356d5b22ee894b03c168
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1afb9052128f8f9ac23d899962423181
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fec8829f674bfdc40ebced5a35ecf1cc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_20b983f3fac43699d89fba214cab54a5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_08c6d94ca12dfdf565cfafc12ef778c8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b7d06d2ba9d750cee14e986ea85113c3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_154ff47493d994b3583f5663eb8cdab1 |
| publicationDate |
2020-05-01^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-202017000-A |
| titleOfInvention |
Semiconductor structure and its manufacturing method and semiconductor transistor structure manufacturing method |
| abstract |
The present disclosure relates to a semiconductor device and a manufacturing method of fabricating a semiconductor structure. The method includes forming an opening in a substrate and depositing a conformal metal layer in the opening. The depositing includes performing one or more deposition cycles. The deposition includes flowing a first precursor into a deposition chamber and purging the deposition chamber to remove at least a portion of the first precursor. The method also includes flowing a second precursor into the deposition chamber to form a sublayer of the conformal metal layer and purging the deposition chamber to remove at least a portion of the second precursor. The method further includes performing a metallic halide etching (MHE) process that includes flowing a third precursor into the deposition chamber. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11437474-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I764548-B |
| priorityDate |
2018-08-30^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |