http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-202031764-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_20d3042eb4ea7c9afd525aa89373349d |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K3-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2019-12-19^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_299e81f5a72b392abdb219280feebbf3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_87b99267f268944f21d923986e01fb50 |
| publicationDate | 2020-09-01^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-202031764-A |
| titleOfInvention | Resist composition |
| abstract | The object of the present invention is to provide a resist composition that has high heat resistance and can be used in lithography using electron beams and extreme ultraviolet rays. Specifically, a resist composition comprising a novolak type phenol resin (C) containing an aromatic compound (A) represented by the following formula (1) and an aliphatic aldehyde (B) as necessary reaction materials is used Metal salt (In the aforementioned formula (1), R 1 and R 2 each independently represent a hydrogen atom, an aliphatic hydrocarbon group with 1 to 9 carbon atoms, an alkoxy group, an aryl group, an aralkyl group, or a halogen atom; m and n are each independently Ground represents an integer from 0 to 4; when R 1 is a plural number, the plural R 1 may be the same as or different from each other; when R 2 is plural, the plural R 2 may be the same or different from each other; R 3 represents hydrogen Atom, an aliphatic hydrocarbon group having 1 to 9 carbon atoms, or a structural site having one or more substituents selected from an alkoxy group, a halogen group, and a hydroxyl group on the hydrocarbon group). |
| priorityDate | 2018-12-26^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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