| abstract |
The present invention provides a photosensitive ray-sensitive or radiation-sensitive resin composition that has excellent resolution and can form patterns with excellent LWR performance. In addition, the present invention provides a photoresist film and a pattern forming method using the above-mentioned sensitizing radiation-sensitive or radiation-sensitive resin composition, and a manufacturing method of an electronic device using the above-mentioned pattern forming method. The actinic ray-sensitive or radiation-sensitive resin composition of the present invention includes a resin and a compound that generates an acid by irradiation with actinic rays or radiation, and the A value obtained by formula (1) is 0.130 or more, and The above-mentioned compound that generates acid by irradiation with actinic rays or radiation includes one or more selected from the group consisting of compound (I) to compound (III). |