http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-202122638-A

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inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c34d504f10b7a3f57a0ee6331e690663
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publicationDate 2021-06-16^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-202122638-A
titleOfInvention Cobalt chemistry for smooth topology
abstract An electroplated cobalt deposit and a method of electrodepositing cobalt on a surface to produce a level deposit across the surface of the substrate. The cobalt electrolyte contains (1) a source of cobalt ions; (2) boric acid; (3) a pH adjuster; and (4) an organic additive, which contains a suppressor. The electroplated cobalt deposit exhibits a level surface such that the thickness difference across substantially the entire surface of the substrate of less than about 200 nm.
priorityDate 2019-12-13^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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