http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-202134466-A

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filingDate 2018-10-25^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_684b36793f3ebe6e4be9ad0edba04335
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_98184f6454c8ef287d851ca3a5ccbe9f
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publicationDate 2021-09-16^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-202134466-A
titleOfInvention Treatment liquid and treatment method
abstract According to an embodiment of the present invention, a treatment liquid is provided. The treatment liquid of the present invention is used to treat by-products produced by the method of depositing silicon-containing substances on a substrate using a gas containing silicon and halogen. The treatment liquid of the present invention contains at least one of an inorganic base and an organic base, and is alkaline.
priorityDate 2018-03-23^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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