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filingDate 1999-10-29^^<http://www.w3.org/2001/XMLSchema#date>
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inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_685efcaa75c79ffabd159f4c3550ac9b
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publicationDate 2001-09-01^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-452929-B
titleOfInvention Method for improving adhesion to copper
abstract Poorly adherent layers such as silicon nitride and silicon dioxide exhibit improved adhesion to copper member by providing an intervening germanium-containing layer. The germanium-containing layer is cooper germanide, germanium oxide, germanium nitride or combinations thereof. The germanium-containing layer enhances the adhesion such that the poorly adherent layer is less susceptible to delamination from the copper member.
priorityDate 1999-01-14^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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