http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-501266-B

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filingDate 2001-04-25^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2002-09-01^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e285ddfb4c19ad9f8f60d38f560d004b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7dd6fb0d55cfb1b1f2fccc586c692799
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publicationDate 2002-09-01^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-501266-B
titleOfInvention A high voltage thin film transistor with improved on-state characteristics and method for making same
abstract The present invention is directed to an SOI LDMOS device having improved current handling capability, particularly in the source-follower mode, while maintaining an improved breakdown voltage capability. The improvement in current handling capability is achieved in a first embodiment by introducing an offset region between the source and thin drift regions. The offset region achieves an offset between the onset of the linear doping profile and the thinning of the SOI layer that results in the thin drift region. In a second embodiment a further increase in the current handling capability of an SOI device is achieved by fabricating an oxide layer over the offset region, with the thickness of the oxide layer varying up to about half the thickness of the oxide layer fabricated over the thin drift region.
priorityDate 2000-03-30^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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