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filingDate 1999-05-13^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2003-03-11^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-523556-B
titleOfInvention Process for etching thin-film layers of a workpiece used to form microelectronic circuits or components
abstract A process for removing at least one thin-film layer from a surface of a workpiece pursuant to manufacturing a microelectronic interconnect or component is set forth. Generally stated, the process comprises the oxidation of at least a portion of the at least one thin-film layer and the etching of the oxidized thin-film layer using an etchant that selectively etches primarily the oxidized thin-film layer.
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priorityDate 1998-05-12^^<http://www.w3.org/2001/XMLSchema#date>
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