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filingDate 2002-10-25^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2004-05-11^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6a72c00f2a23951ac58d2e48dbcc9507
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_91e20cb53cd4405f5640112340db5437
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publicationDate 2004-05-11^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-587274-B
titleOfInvention Semiconductor device and a method for manufacturing thereof
abstract The present invention is related to semiconductor device and its manufacturing method. The semiconductor device is provided with the followings: semiconductor substrate on which devices are formed; low-dielectric-constant insulating film, which has a relative permittivity of 3 or below and is formed on the semiconductor substrate; a plug and a wiring layer, which are buried in a low-dielectric-constant insulating film; a high-Young's-modulus insulating film, which has a Young's modulus larger than 15 GPa and is formed between the low-dielectric-constant insulating film and the plug, so as to contact with the sides of plug.
priorityDate 2001-12-26^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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