http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I263558-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D3-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-24 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L9-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D3-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L101-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-14 |
| filingDate | 2001-10-24^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2006-10-11^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_595c4af849a6d235b96ee2597604e595 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_70c9af4244f6110ed1cb0511c4f0583e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f002c821fb850e50b0d7912dd2ae4396 |
| publicationDate | 2006-10-11^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I263558-B |
| titleOfInvention | Composition for forming polishing pad and polishing pad using the same |
| abstract | It is an object of the invention to provide a composition for forming a polishing pad comprising substances having specific functional groups exhibiting excellent hydrophilic properties and the like, a crosslinked body for polishing pad as well as a polishing pad with excellent water resisting and durability which exhibits excellent polishing performance including a high removal rate and method for producing thereof. The composition for forming a polishing pad comprises a crosslinkable elastomer having no carboxyl, amino, hydroxyl, epoxy, sulfonic acid and phosphoric acid groups, and a water-insoluble substance having at least one functional group selected from the group consisting of carboxyl, amino, hydroxyl, epoxy, sulfonic acid and phosphoric acid groups. And a water-soluble substance such as cyclodextrin may be contained. A polishing pad can be manufactured using the composition above or the crosslinked body for polishing pad, and porous polishing pads may also be obtained. |
| priorityDate | 2000-10-24^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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