http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I639890-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0606c8e113c860d8a6c41e2aaaf3120d |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L79-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 |
| filingDate | 2015-12-17^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2018-11-01^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_04c8eea1fe6ca78438c8b86d8bd68516 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_86e454c8e92cd14a0646e3b83822adb2 |
| publicationDate | 2018-11-01^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I639890-B |
| titleOfInvention | Photosensitive resin composition and application thereof |
| abstract | A photosensitive resin composition comprising: an alkali-soluble resin (A); a compound (B) containing an ethylenically unsaturated group; a photoinitiator (C); and a solvent (D). The alkali-soluble resin (A) is selected from a polyamic acid resin, a polyamidene resin or a combination thereof, and is reacted by a mixture comprising a tetracarboxylic dianhydride component and a diamine component. be made of. The tetracarboxylic dianhydride component includes a bicyclic alicyclic tetracarboxylic dianhydride compound (a-1). The diamine component includes a diamine compound (b-1) having an acrylate group as shown in the formula (I). The cured film formed of the photosensitive resin composition is excellent in adhesion and heat yellow resistance. |
| priorityDate | 2015-12-17^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
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