| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T137-4238
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T137-0402
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B9-00 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67051
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B3-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6831
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B3-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B3-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B17-04 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B3-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683 |
| filingDate |
2014-12-10^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2019-09-11^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4d4efb466fa2c02b8be3289f70ce1520
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_44beb4e9bb8320caa3e0e6985c7dfe19
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f8ce66455fa06538da52fba075429a03
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a53b18ad64e6e360110711cb90b54456 |
| publicationDate |
2019-09-11^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I671135-B |
| titleOfInvention |
Cleaning fixture assembly and electrostatic chuck cleaning method |
| abstract |
A cleaning fixture assembly for protecting an electrostatic chuck suitable for supporting a semiconductor substrate during a cleaning process includes a plate configured to align with and engage with a back side of the electrostatic chuck, the plate having a surrounding An annular seal of a container. The cleaning fixture assembly also includes: a first O-ring that is engaged with the annular sealing portion of the plate; a plurality of through holes located in the container chamber of the plate; and a plurality of O-rings surrounding the plate A plurality of through holes in the container. A plurality of through-hole systems are configured to align and be in fluid communication with the lift pin holes and helium holes in the back side of the electrostatic chuck, and a plurality of O-ring systems are positioned to allow the cleaning medium to engage the electrostatic chuck during the cleaning process The lifting pin hole and helium hole in the middle, while sealing the cleaning medium to prevent it from reaching the back side of the electrostatic chuck. |
| priorityDate |
2013-12-12^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |