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filingDate 2016-02-25^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2020-02-21^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a10c22008b61044d8d660c3cde26eae7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_006eb389103cb336fbe39fc949599366
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publicationDate 2020-02-21^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-I685513-B
titleOfInvention Photosensitive resin composition, method for manufacturing resin cured film, and semiconductor device
abstract A photosensitive resin composition containing polyimide and polybenzo Azole, polyimide precursor, polybenzo A photosensitive resin composition of one or more alkali-soluble resins and photosensitizers selected from the group consisting of azole precursors and copolymers of two or more polymers selected from the group consisting of the following general formula (1) The indicated compound. The present invention provides a photosensitive resin composition whose cured film is excellent in adhesion to metal materials, especially copper, and exhibits high chemical resistance even when fired at a low temperature.
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priorityDate 2015-03-04^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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