| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0606c8e113c860d8a6c41e2aaaf3120d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1333
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B33-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
| filingDate |
2017-06-12^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2021-08-11^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d53f1f66ff2b758e6780142c36f4dc57
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_81b662c1d4504ce87656a76ff47f36df |
| publicationDate |
2021-08-11^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I735595-B |
| titleOfInvention |
Positive photosensitive polyalkylsiloxane composition and application of the same |
| abstract |
The present invention provides a positive photosensitive poly alkylsiloxane composition and an application of the same. The positive photosensitive poly alkylsiloxane composition includes a polyalkylsiloxane (A), an ortho-naphthoquinone diazide sulfonic acid ester (B), a solvent (C) and a silicon compound having a hindered amino group (D). A thin film formed by the positive photosensitive poly alkylsiloxane composition has good heat resistance and adhesiveness. |
| priorityDate |
2017-06-12^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |