| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_888d1c536d6169b2e18c4a464ccbd346
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7b5e4171f917081d199f92651f4cb69b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_76709b8a879451fba814c595ee51c2b8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_902e39a5cda43b940feeca668c700adb |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B15-01
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01D3-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01G25-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-665
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25C3-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-48 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01D3-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D3-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01G25-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D5-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D3-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B15-01
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25C3-26 |
| filingDate |
2017-03-21^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2018-10-23^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5a85613b03643322ebe2e8f27f257453
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4425eaeeeb608d3aa955188d0f6f17fb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9466532a1132b059c623bccb295f20d9 |
| publicationDate |
2018-10-23^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-10106902-B1 |
| titleOfInvention |
Zirconium coating of a substrate |
| abstract |
This invention provides an electrolyte salt for use in an electrodeposition process for depositing Zirconium metal on a thin foil substrate. The prior art electrochemical process causes a reaction between a uranium substrate and ZrF 4 species in the electrolyte that causes the formation of UF x at the substrate surface that prevents the formation of a dense uniform zirconium coating. This problem is solved by using an electrolyte salt in an electrodeposition process consisting of lithium fluoride (LiF) in a concentration ranging between about 11.5 molar percent and about 61 molar percent and one or more salts selected from the group consisting of sodium fluoride (NaF), potassium fluoride (KF), cesium fluoride (CsF), or cesium chloride (CsCL). Zirconium is added to the electrolyte salt through an addition of zirconium fluoride (ZrF 4 ) in the range of about 1 to about 5 mass percent (w/w %). The Zr coating is of at least 98% pure Zr with a density of at least 98%. |
| priorityDate |
2016-03-22^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |