| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_696ca0ae93d5cf5a686273601361781f |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2601-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L61-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G83-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C39-15 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C39-15
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L61-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G83-00 |
| filingDate |
2016-03-17^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2020-05-05^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cefa9ac620243efd3d30dd8694d00a8d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_93afc2be26d5dddff5f926f22d976c82
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f853984c85e67773ba6e4556eadbb0f8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5e5c5373e96669bd8a8ae017dd242d0f |
| publicationDate |
2020-05-05^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-10642156-B2 |
| titleOfInvention |
Resist base material, resist composition and method for forming resist pattern |
| abstract |
The present invention provides a resist base material containing a compound having a specific structure and/or a resin derived from the compound as a monomer. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021331994-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021206901-A1 |
| priorityDate |
2015-03-30^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |