| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fda353b84ebf303bfc237d8bd8e22966
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1409
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1436 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 |
| filingDate |
2018-03-02^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2021-06-15^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d47b38703662dc359c0b2b991b27e96
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_614e1f0134dbab3b639805ef60dfdd94
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8fc95e212d580c09fdfc85d44726344d |
| publicationDate |
2021-06-15^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-11034860-B2 |
| titleOfInvention |
Polishing agent, stock solution for polishing agent, and polishing method |
| abstract |
A polishing agent containing abrasive grains and water, in which the abrasive grains contain silica particles, an average particle diameter R ave of the abrasive grains is 50 nm or more, a ratio R ave /R min of the average particle diameter R ave to an average minor diameter R min of the abrasive grains is 1.0 to 2.0, and a zeta potential of the abrasive grains in the polishing agent is positive. |
| priorityDate |
2017-03-14^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |