http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11039527-B2

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filingDate 2019-01-28^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2021-06-15^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_51cffe52979b96db83815c55fdb89197
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publicationDate 2021-06-15^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-11039527-B2
titleOfInvention Air leak detection in plasma processing apparatus with separation grid
abstract Plasma processing apparatus and associated methods for detecting air leak are provided. In one example implementation, the plasma processing apparatus can include a processing chamber to process a workpiece, a plasma chamber separated from the processing chamber by a separation grid, and an inductive coupling element to induce an oxygen plasma using a process gas in the plasma chamber. The plasma processing apparatus can detect afterglow emission strength from reaction between nitric oxide (NO) and oxygen radical(s) in a process space downstream to an oxygen plasma to measure nitrogen concentrations due to presence of air leak.
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