http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11465237-B2

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filingDate 2019-01-31^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2022-10-11^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_501ede44c180ed90469d45ce1208f7c9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_223e0b6453fc8ca18a4dbf228139fcaa
publicationDate 2022-10-11^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-11465237-B2
titleOfInvention Gas supply device and laser processing head comprising same
abstract A gas supply device for a laser machining head is provided for generating a homogeneous gas flow. The gas supply device includes a gas inlet, a shared volume for superimposing a laser beam and the gas flow, and a gas channel system which, starting from the gas inlet, branches at least twice and connects the gas inlet with several outlet openings at the shared volume. The gas channel system and the outlet openings are configured to provide a substantially homogeneous gas flow to the shared volume.
priorityDate 2018-02-02^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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