http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2002003817-A1

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01S3-225
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01S3-139
filingDate 2001-02-22^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6cfdfa511289dbed2f170f4603950a31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5c80b8dc111c9fd53da75b420ffaaece
publicationDate 2002-01-10^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2002003817-A1
titleOfInvention Absolute wavelength calibration of lithography laser using multiple element or tandem see through hollow cathode lamp
abstract A tunable laser system includes a gain medium and an optical resonator for generating a laser beam, and a spectral narrowing and tuning unit within the resonator. A detection and control unit controls a relative wavelength of the laser system. A wavelength calibration module calibrates the detection and control unit. The module contains more than one species each having an optical transition line within the tuning spectrum of the laser. A beam portion of the narrowed emission from the laser is directed through the wavelength calibration module and a beam portion is directed through the detection and control unit when the laser beam is scanned through the optical transition line of each of the species within the module. The detection and control unit is monitored and calibrated during the scanning.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105977776-A
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7268869-B2
priorityDate 2000-03-01^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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