patent/US-2002086106-A1

http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2002086106-A1

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filingDate	2001-11-07^^<http://www.w3.org/2001/XMLSchema#date>
inventor	http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e6ede252462bc27dbbf5a753d6b217f9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_78d8a0684c543e505fc7bc400301ab45 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_21fffac62777346f1d4ab29f35d54ee4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f17f3656277818d75261933bfc0a703 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_181c905000581a5d9c5a3e78f24d4d3e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_092fd94afa1b0060d104fd2b363a7315
publicationDate	2002-07-04^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber	US-2002086106-A1
titleOfInvention	Apparatus and method for thin film deposition
abstract	The apparatus for forming a thin film includes a reaction chamber having a top portion, a sidewall portion and a bottom portion; a gas injector penetrating the top portion and letting a source element pass therethrough; a distributor connected to the gas injector, wherein a plurality of injection holes are formed in the distributor and the source element is injected through the plurality of injection holes; and u substrate heating member positioned in a reaction space defined by the top, bottom and sidewall portions of the reaction chamber, and arranged below the distributor.
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priorityDate	2000-11-07^^<http://www.w3.org/2001/XMLSchema#date>
type	http://data.epo.org/linked-data/def/patent/Publication

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