http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2002121287-A1

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filingDate 2001-03-02^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_36f8d610675174daa56c00fc6f14ebd1
publicationDate 2002-09-05^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2002121287-A1
titleOfInvention Method for removing organic material from a substrate and for oxidizing oxidizable material thereon
abstract Embodiments in accordance with the present invention provide for removing organic materials from substrates, for example substrates employed in the fabrication of integrated circuits, liquid crystal displays and the like. Such embodiments also provide for forming self-limiting oxide layers on oxidizable materials disposed on such substrates where such materials are exposed to the methods of the present invention. The methods of the present invention provide for contacting substrates with a solution of ozone, water and a surfactant, the solution being effective for removing organic materials and forming self-limiting oxide layers on oxidizable materials.
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priorityDate 2001-03-02^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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