http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003108816-A1

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-08
filingDate 2002-10-30^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d7f3de1b4f0e12c0902a3fb670cafb62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_21eb73b53a2c68abee3c30d58289b0a5
publicationDate 2003-06-12^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2003108816-A1
titleOfInvention Positive type actinic ray-curable dry film and pattern-forming method by use of the same
abstract A method of forming a resist pattern film. A positive type actinic ray decomposing and developing dry film is applied onto a surface of a coating substrate so that the surface of the coating substrate may face to the urethane resin layer of the dry film. Then, the dry film may be heat treated. The non-actinic ray-curable substrate of the dry film, then, is optionally stripped, and is heat treated if it has not already been heat treated. Then, an actinic ray is irradiated through a mask or directly onto the surface of the dry film so as to obtain an intended pattern and is optionally heat treated. The non-actinic ray-curable substrate which was not previously stripped is, then, stripped. Then, the positive type actinic ray-curable urethane resin layer is subjected to a developing treatment. Finally, an unnecessary area of the urethane resin layer to form a resist pattern film is removed.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009232979-A1
priorityDate 1999-08-25^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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