| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6a6c760472ee4c29e9cd26152ace2eb0 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1285 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-6675
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-066
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-324
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-268 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-84
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-77 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-268
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-324
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23K26-06 |
| filingDate |
2004-04-23^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f63903890cc74944e6fd5acae99e95a6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_acb0d8b39b8175a3787579d04ecc3abe |
| publicationDate |
2004-11-11^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2004224447-A1 |
| titleOfInvention |
Multi-pattern shadow mask laser annealing system |
| abstract |
A multi-pattern shadow mask, shadow mask laser annealing system, and a multi-pattern shadow mask method for laser annealing are provided. The method comprises: supplying a silicon substrate; supplying a multi-pattern shadow mask with a plurality of aperture patterns; creating substrate alignment marks; with respect to the alignment marks, laser annealing a substrate region in a plurality of aperture patterns; forming a corresponding plurality of polysilicon regions; and, forming a corresponding plurality of transistor channel regions in the plurality of polysilicon regions. Typically, the shadow mask includes a plurality of sections, with each section having at least one aperture pattern. A shadow mask section can be selected to create a corresponding aperture pattern. If the mask section includes a plurality of aperture patterns, the selection of a section creates all the corresponding aperture patterns in the selected section. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7804148-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007155102-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8785815-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013191863-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7622374-B2 |
| priorityDate |
2002-04-17^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |