http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005257570-A1

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filingDate 2003-07-07^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_35f5b9b9ed36e9cdaacb2dca72b16b8b
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publicationDate 2005-11-24^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2005257570-A1
titleOfInvention Method and device for producing a blank mold from synthetic quartz glass by using a plasma-assisted deposition method
abstract The invention relates to a method for producing a blank mold from synthetic quartz glass by using a plasma-assisted deposition method, according to which a hydrogen-free media flow containing a glass starting material and a carrier gas is fed to a multi-nozzle deposition burner. The glass starting material is introduced into a plasma zone by the deposition burner and is oxidized therein while forming SiO 2 particles, and the SiO 2 particles are deposited on a deposition surface while being directly vitrified. In order to increase the deposition efficiency, the invention provides that the deposition burner ( 1 ) focuses the media flow toward the plasma zone ( 4 ) by. A multi-nozzle plasma burner, which is suited for carrying out the method and which is provided with a media nozzle for feeding a media flow to the plasma zone, is characterized in that the media nozzle ( 7 ) is designed so that it is focussed toward the plasma zone ( 4 ). The focussing is effected by a tapering ( 6 ) of the media nozzle ( 7 ).
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11560627-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010162768-A1
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8820121-B2
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priorityDate 2002-07-09^^<http://www.w3.org/2001/XMLSchema#date>
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