| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1af8df51ce24ca931ae718fb747f6aa0 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2329-8655
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2329-8645
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2329-864
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2329-8665
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2201-3165 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J9-242
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J29-864
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J1-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J1-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J29-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J31-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J31-127
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J9-185 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J1-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J31-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J29-86
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J1-05
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J29-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J1-14 |
| filingDate |
2005-06-24^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_86409a52f338cb38fd2f2970ad4b853c |
| publicationDate |
2005-12-29^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2005285503-A1 |
| titleOfInvention |
Image forming apparatus |
| abstract |
The invention provides an image forming apparatus in which orbit shift can be prevented to perform good image display in an electron beam emitted from the electron-emitting device adjacent to the spacer when an antistatic spacer coated with a high resistance film is used. A surface shape is controlled by forming a fine particle film on the surface of a row directional wiring 5 in which a spacer 3 is arranged, the electron emission is realized from electron-emitting areas 14 a and 14 b near contacting areas 15 a and 15 b in a non-contacting area 16 in which the spacer 3 is not in contact with the row directional wiring 5, and the non-contacting area 16 of the spacer 3 is irradiated with the electron to decrease a potential, which allows a good equipotential line 17 to be formed. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009153020-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7429821-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1939916-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008157650-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7626324-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005264166-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007267953-A1 |
| priorityDate |
2004-06-29^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |