http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009003025-A1

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filingDate 2007-06-26^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e5bd3b3ad07fd917ce516053f21ba973
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publicationDate 2009-01-01^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2009003025-A1
titleOfInvention Dual bit line metal layers for non-volatile memory
abstract Structures and techniques are disclosed for reducing bit line to bit line capacitance in a non-volatile storage system. The bit lines are formed at a 4 f pitch in each of two separate metal layers, and arranged to alternate between each of the layers. In an alternative embodiment, shields are formed between each of the bit lines on each metal layer.
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