| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-114 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2006-07-10^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bfdc8fad2313e61cff73c1440ad84526
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_de9c993ed66f82baae6aa97500ecf35e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_321d114d76108c3dfde0d4c0b5877dde |
| publicationDate |
2010-04-29^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2010104972-A1 |
| titleOfInvention |
Resist composition and method of forming resist pattern |
| abstract |
A resist composition of the present invention is obtained by dissolving a resin component (A) that displays changed alkali solubility under action of acid and an acid generator component (B) that generates acid upon exposure in an organic solvent (S), wherein the organic solvent (S) includes an aromatic organic solvent (S1). According to the present invention, a resist composition and a method of forming a resist pattern, in which the level of LWR is reduced, can be provided. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011229661-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8932798-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9034440-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9964848-B2 |
| priorityDate |
2005-08-03^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |