| abstract |
A resist composition comprising:n (A) a resin being insoluble or poorly soluble in an alkali aqueous solution but becoming soluble in an alkali aqueous solution by the action of an acid, (B) a polyhydric phenol compound represented by the formula (1): nn n n n n n n n n n wherein at least one selected from the group consisting of R 1 , R 2 , R 3 , R 4 , and R 5 is a group represented by the formula (2): n n n n n n n n n n n n n n wherein X 1 and X 2 each independently represent a hydrogen atom etc., n represents an integer of 1 to 4, Z 1 represents a C1-C6 alkyl group etc., and ring Y represents an alicyclic hydrocarbon group, n n n and the others are hydrogen atoms, and n (C) an acid generator. |