| abstract |
A (meth)acrylate compound having an acid-labile ester group, a photosensitive polymer, and a resist composition including the same, the (meth)acrylate compound being represented by the following Chemical Formula 1 n n n n n n n n n n n n wherein, R 1 is hydrogen or methyl, R 2 and R 3 are each independently a substituted or unsubstituted linear alkyl, a substituted or unsubstituted cyclic alkyl, or linked each other to form a monocyclic ring or a fused-ring, and R 4 is a linear ester or cyclic ester group. |