| abstract |
The invention relates to a method and a device for the coating of running substrates ( 25 ) moving along a run direction through a treatment zone ( 6 ), in which the vapour of a coating material is generated in a chamber ( 5 ), this vapour passing through a treatment aperture towards the treatment zone ( 6 ) where the coating material condenses on the surface of the substrates ( 25 ). The vapour flow through the treatment aperture is controlled by adjusting the extent to which the treatment aperture is shut off by at least one shutter ( 13 ), between an open position, in which said vapour flows through the treatment aperture towards the treatment zone ( 6 ), and a closed position, in which the vapour is prevented from flowing towards the treatment zone ( 6 ) through the treatment aperture. |