| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-202
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03B27-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate |
2009-11-19^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_156cd0ccfd8d84e45134f77d4f5933a4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be835a103388ce1c8816005f37adda0b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2e82653ba4444ac57375740ceeb8f682
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1c59485851f31050bab7984e3210153a |
| publicationDate |
2010-11-25^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2010297550-A1 |
| titleOfInvention |
Compositions comprising sulfonamide material and processes for photolithography |
| abstract |
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that have sulfonamide substitution. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009117489-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9244355-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9034558-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014038102-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9158198-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8871428-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9482945-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10222699-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008193872-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8257902-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016066095-A |
| priorityDate |
2008-11-19^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |