http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011117490-A1

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filingDate 2010-06-28^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9c976cd4fa4872cb72576567b4689919
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publicationDate 2011-05-19^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2011117490-A1
titleOfInvention Methods of forming electronic devices
abstract Methods of forming electronic devices are provided. The methods involve alkaline treatment of photoresist patterns and allow for the formation of high density resist patterns. The methods find particular applicability in semiconductor device manufacture.
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http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID127921545
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID448674543
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID410538339
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID20519
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID410538345
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID31246
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID61344
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559564
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419539241
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID11856523
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID127900651
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID244771740

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