http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011295033-A1

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K3-16
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-02
filingDate 2011-08-08^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8d7652b09b6e2c5818b0f4dfcd89ea6a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_72a317ba5ea23449124d797b8c768c57
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publicationDate 2011-12-01^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2011295033-A1
titleOfInvention Low-impurity organosilicon product as precursor for cvd
abstract The present invention provides an organosilicon composition comprising diethoxymethylsilane, a concentration of dissolved residual chloride, and a concentration of dissolved residual chloride scavenger that does not yield unwanted chloride salt precipitate when combined with another composition comprising diethoxymethylsilane.
priorityDate 2006-06-13^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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